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  • 专利标题:   Reducing square resistance of graphene film comprises soaking graphene film and a substrate into a solution containing electron donors or a donor cavity for a certain period of time.
  • 专利号:   CN102180463-A
  • 发明人:   LI Y, CHEN Y, WANG Z, LI P
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   C01B031/04, H01B001/04, H01B013/00
  • 专利详细信息:   CN102180463-A 14 Sep 2011 C01B-031/04 201210 Pages: 6 Chinese
  • 申请详细信息:   CN102180463-A CN10041766 21 Feb 2011
  • 优先权号:   CN10041766

▎ 摘　　要

NOVELTY - Reducing square resistance of graphene film comprises: soaking graphene film and a substrate into a solution containing electron donors or a donor cavity for a certain period of time. USE - The method is useful for reducing square resistance of graphene film.