▎ 摘　　要

NOVELTY - The device has a silicon substrate provided with an optical waveguide and a heating electrode e.g. grid-type heating electrode or fold-line heating electrode and snake-shaped heating electrode, located above the optical waveguide. The heating electrode is provided with a hollow area. A heat field adjusting plate is located between the optical waveguide and the heating electrode. The heat field adjusting plate adjusts conduction range of heat field generated by the heating electrode during heating process of the heating electrode such that the optical waveguide is uniformly heated. USE - Silicon optical device for heating an optical waveguide during heating process of a heating electrode. ADVANTAGE - The heat field adjusting plate is used in the heating process of the heating electrode, and adjusts the conduction range of the heat field generated by the heating electrode, so that the optical waveguide is uniformly heated. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a silicon optical device for heating an optical waveguide during heating process of a heating electrode.