• 专利标题:   Preparation of quantum dot-hybrid reduced graphene oxide nanofilm photosensitive sensor involves forming graphene oxide film having specified thickness, on substrate, hybridizing and performing photochemical reduction process.
  • 专利号:   CN105244415-A
  • 发明人:   LU D, ZOU G, BA Z, PAN S
  • 专利权人:   NANJING INST TECHNOLOGY
  • 国际专利分类:   H01L031/028, H01L031/0352, H01L031/101, H01L031/18
  • 专利详细信息:   CN105244415-A 13 Jan 2016 H01L-031/18 201642 Chinese
  • 申请详细信息:   CN105244415-A CN10679123 19 Oct 2015
  • 优先权号:   J, HE XCN10679123

▎ 摘  要

NOVELTY - Preparation of quantum dot-hybrid reduced graphene oxide nanofilm photosensitive sensor involves forming graphene oxide film having thickness of 20-100 nm, on a substrate, hybridizing, obtaining quantum dot-hybrid graphene oxide nanofilm, performing photochemical reduction process under protective atmosphere, obtaining electrode and forming photosensitive sensor using the electrode. USE - Preparation of quantum dot-hybrid reduced graphene oxide nanofilm photosensitive sensor (claimed). ADVANTAGE - The method provides quantum dot-hybrid reduced graphene oxide nanofilm photosensitive sensor having excellent photoelectric property and photosensitivity, by simple and economical process.