▎ 摘　　要

NOVELTY - Plasma-enhanced chemical vapor deposition (PECVD) type graphene film coating device comprises vacuum chambers and a substrate conveying mechanism. The substrate conveying mechanism passes through the multiple vacuum chamber. The vacuum chamber comprises rolling chamber (1) and a coating chamber (2). The upper and lower two sides of the foam nickel base material are respectively provided with radio frequency discharge plate and plasma magnetic control enhanced device. The plasma magnetic control enhanced device comprising a magnetic base body (7), magnetic body (8) and graphite plates (9). USE - Plasma-enhanced chemical vapor deposition type graphene film coating device. ADVANTAGE - The plasma-enhanced chemical vapor deposition (PECVD) type graphene film coating device the speed of the graphene film. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for method for PECVD type graphene film coating, which involves: (A) discharging the foam nickel substrate unwinding chamber and sending in each plating chamber by the substrate conveying mechanism; (B) opening the radio frequency discharge plate to discharge to generate plasma and increasing the plasma density on the surface of the foam nickel substrate deposition film layer; and (C) finishing the plating in turn by multiple coating chamber after the foam nickel base into the collecting chamber. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of plasma-enhanced chemical vapor deposition type graphene film coating device. Rolling chamber (1) Coating chamber (2) Magnetic base body (7) Magnetic body (8) Graphite plates (9)