• 专利标题:   Manufacture of porous graphene component involves introducing carbon source and substitution source in vapor deposition furnace, and simultaneously depositing carbon monoatomic layer on substrate positioned in furnace.
  • 专利号:   JP2017100897-A, JP6362582-B2
  • 发明人:   KIM H, KWON G
  • 专利权人:   KOREA INST ENERGY RES, KOREA INST ENERGY RES
  • 国际专利分类:   C01B032/15, C01B032/18, C01B032/182, C23C016/26, C01B032/194
  • 专利详细信息:   JP2017100897-A 08 Jun 2017 C01B-032/15 201742 Pages: 16 Japanese
  • 申请详细信息:   JP2017100897-A JP233749 30 Nov 2015
  • 优先权号:   JP233749

▎ 摘  要

NOVELTY - Manufacture of porous graphene component involves performing process of introducing carbon source and substitution source in vapor deposition furnace, simultaneously depositing carbon monoatomic layer on substrate positioned inside the vapor deposition furnace using the carbon atoms generated by thermal decomposition of carbon source, and artificially introducing crystal defect into covalent bond part of carbon atoms constituting the carbon monoatomic layer by using substitutional atoms generated by thermally decomposing substitution reaction source in in-situ system. USE - Manufacture of porous graphene component (claimed). ADVANTAGE - The manufacturing method of porous graphene component is simple. DETAILED DESCRIPTION - Manufacture of porous graphene component involves performing process of introducing carbon source and substitution source in vapor deposition furnace, simultaneously depositing carbon monoatomic layer on substrate positioned inside the vapor deposition furnace using the carbon atoms generated by thermal decomposition of carbon source, artificially introducing crystal defect into covalent bond part of carbon atoms constituting the carbon monoatomic layer by using substitutional atoms generated by thermally decomposing substitution reaction source in in-situ system, substituting carbon atoms of crystal defect part with substitutional atoms, forming porous graphene component in which pores which penetrate carbon monoatomic layer are formed, and separating porous graphene component from substrate. INDEPENDENT CLAIMS are included for: (1) manufacturing apparatus of porous graphene component including sample supply apparatus provided with 1st and 2nd sample supply apparatuses, simultaneous vaporizer provided with 1st and 2nd vaporizers, and vapor deposition furnace provided with substrate; and (2) porous graphene component. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the manufacturing method of porous graphene component. (Drawing includes non-English language text). Vaporizing step (S10) Precursor introduction step (S20) Pore formation step (S30)