▎ 摘　　要

NOVELTY - Three-dimensional structure substrate surface is covered with graphene thin film by cleaning and drying surface of three-dimensional structure substrate (4), placing in vacuum chamber (3) of chemical vapor deposition device, discharging air, filling with protective gas, heating to graphene growth temperature, introducing carbon source gas and protective gas carrier, maintaining pressure at graphene growth pressure to directly grow graphene on substrate surface, cooling to 10-30 degrees C in vacuum chamber containing protective gas with pressure at graphene growth pressure, and taking out. USE - Covering of three-dimensional structure substrate surface with graphene thin film (claimed). ADVANTAGE - Covering of three-dimensional structure substrate surface with graphene thin film is simple, short, and low-cost, and graphene thin film is continuous and uniform. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram for the covering of three-dimensional structure substrate surface with graphene thin film. (Drawing includes non-English language text). Air inlet (1) High-temperature furnace (2) Vacuum chamber (3) Three-dimensional structure substrate (4) Vacuum pump (5)