• 专利标题:   Making water-soluble transfer stack by e.g. applying intercalating solution and transfer layer to growth stack, and delaminating water-soluble polymer film together with two-dimensional material layer to obtain delaminated film.
  • 专利号:   WO2022129049-A1
  • 发明人:   SHIVAYOGIMATH A, BOGGILD P, BOOTH T J
  • 专利权人:   UNIV DANMARKS TEKNISKE
  • 国际专利分类:   C01B032/19, H01L021/02, H01L021/18, H01L021/683
  • 专利详细信息:   WO2022129049-A1 23 Jun 2022 H01L-021/02 202256 Pages: 47 English
  • 申请详细信息:   WO2022129049-A1 WOEP085690 14 Dec 2021
  • 优先权号:   EP213739

▎ 摘  要

NOVELTY - Manufacturing (M1) a water-soluble transfer stack (5) comprising multiple two-dimensional material layers (2), comprising: (i) providing a growth stack comprising a growth substrate (3) and a two-dimensional material layer; (ii) applying an intercalating solution to the growth stack; (iii) applying a transfer layer comprising a water-soluble polymer film (1), to the growth stack; (iv) delaminating the water-soluble polymer film together with the two-dimensional material layer, thus obtaining a delaminated film (4) from the growth substrate; and (v) repeating the steps (i)-(iv) a number of times, where for each repetition the most recently obtained delaminated film is used as the transfer layer, thus manufacturing a water-soluble transfer stack comprising multiple two-dimensional material layers. USE - The method is useful for manufacturing a water-soluble transfer stack comprising multiple two-dimensional material layers which is used in photovoltaics, semiconductors, electrodes and water purification. ADVANTAGE - The method is simple and versatile. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) water-soluble transfer stack comprising multiple two-dimensional material layers manufactured by the method; (2) manufacturing (M2) multiple two-dimensional material layers on a target substrate, comprising (a) obtaining a water-soluble transfer stack comprising multilayer two-dimensional material, and (b) applying the transfer stack to the target substrate; and (3) multilayer two-dimensional material, comprising multiple layers of a two-dimensional material, where the average maximum height of roughness is below 50 nm. DESCRIPTION OF DRAWING(S) - The figure shows schematic outline of manufacturing a water-soluble transfer stack. Water-soluble polymer film (1) Two-dimensional material layer (2) Growth substrate (3) Delaminated film (4) Water-soluble transfer stack (5)