▎ 摘　　要

NOVELTY - Photodetector comprises: a supporting medium; a layer of graphene on the supporting medium; a layer of semiconductor nanoparticles; and a packaging layer. USE - The photodetector is used for performing flexible and transparent optoelectronics for imaging, spectroscopy, sensing or optical communications (claimed). ADVANTAGE - The photodetector: achieves selective enhancement when the thickness of the supporting medium or packaging layer is modulated (claimed); is capable of operating in the sub-band gap region relative to the band gap of semiconductor nanoparticles; and enables sub-band gap photodetection with enhanced responsivity as compared to pure semiconductor-based photodetectors. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) performing flexible and transparent optoelectronics for imaging, spectroscopy, sensing, or optical communications, comprising providing a photodetector and using the photodetector to detect photons; and (2) manufacturing a graphene semiconductor photodetector, comprising providing a monolayer chemical vapor deposition graphene on a metal, spin-coating a poly(methyl methacrylate) (PMMA) solution in anisole onto the graphene layer and air drying it, removing the metal on the reverse side of the graphene by etching, separating the released graphene on PMMA film and rinsing the film consecutively in many clean deionized water baths, placing the film onto a clean substrate and air drying it, dissolving the PMMA with a solvent, patterning the graphene into a ribbon with e-beam lithography and oxygen, depositing silver in a thermal evaporator on the e-beam lithography in a defined central area of the graphene ribbon, transforming the silver into one of silver chloride, silver bromide, silver iodide by a reaction with chlorine, bromine or iodine respectively, coating aluminum oxide by atomic layer deposition onto the structure, removing the aluminum oxide on the contact area by dipping it in a buttered hydrogen fluoride solution, and patterning a nickel electrode on the graphene ribbon with e-beam lithography followed by metal sputtering, and cleaning the PMMA.