▎ 摘　　要

NOVELTY - A substrate (21) which forms a graphene sheet (50) is arranged in region (II) of CVD reaction container. Camphor vapors are guided on the heated substrate. The vapors are thermally decomposed on the substrate and a graphene sheet is formed on the substrate. The contacting surface of graphene sheet and substrate is wet-etched and the graphene sheet is peeled in the etching solution (60). The peeled graphene sheet is affixed on a target (70), to obtain a transparent conductive film. USE - Formation of transparent conductive film (claimed) for solar cells and electronic apparatus. ADVANTAGE - The method enables simple and economical formation of large-area transparent conductive films having high transmittance and low resistivity, by using a simple apparatus and no explosive gas, such as hydrogen. The graphene sheet can be peeled easily without any damage. Camphor is used instead of rare-metal. DETAILED DESCRIPTION - Camphor is arranged on region (I) of a chemical vapor deposition (CVD) reaction container. A substrate which forms a graphene sheet is arranged in region (II) of CVD reaction container. Region (I) is heated and camphor is vaporized. The vapors are guided on the substrate heated by orienting a carrier gas of inert gas to region (II) and flowing from region (I). The vapors are thermally decomposed on the substrate and a graphene sheet is formed on the substrate. The contacting surface of graphene sheet and substrate is wet-etched and the graphene sheet is peeled in the etching solution. The peeled graphene sheet is affixed on a target, to obtain a transparent conductive film. An INDEPENDENT CLAIM is included for transparent conductive film. DESCRIPTION OF DRAWING(S) - The drawing shows a process drawing of the formation method of transparent conductive film. (Drawing includes non-English language text) Substrate (21) Silicon wafer (40) Graphene sheet (50) Etching solution (60) Target (70)