▎ 摘　　要

NOVELTY - The method involves producing pentacene steam, and evaporating the pentacene steam on a surface of a semiconductor substrate. USE - Graphene passivation layer manufacturing method for a semiconductor device (claimed). ADVANTAGE - The method enables preventing the electrical property of the graphene from being changed with the external factor including air and water after removing a protective film. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a graphene passivation layer manufacturing method. '(Drawing includes non-English language text)'