▎ 摘　　要

NOVELTY - Graphene preparing device comprises screening device for screening the graphite treatment, a first reactor for filtering the selected graphite raw materials, a mixing mechanism for mixing and pulverizing the graphite discharge and the stripping agent to obtain a graphite-stripping agent mixed solution. A second reactor is used to hold graphite-stripping agent mixed solution. A bubble generation mechanism for pressurizing the mixed solution of the graphite-stripping agent contained. A ultrasonic blasting mechanism for detonating the bubbles in the mixed solution of the graphite-stripping agent. USE - Used as graphene preparing device. ADVANTAGE - The device has simple operation and is environment-friendly. DETAILED DESCRIPTION - Graphene preparing device comprises screening device for screening the graphite treatment, a first reactor for filtering the selected graphite raw materials, a mixing mechanism for mixing and pulverizing the graphite discharge and the stripping agent to obtain a graphite-stripping agent mixed solution. A second reactor is used to hold graphite-stripping agent mixed solution. A bubble generation mechanism for pressurizing the mixed solution of the graphite-stripping agent contained in the second reactor. A ultrasonic blasting mechanism for detonating the bubbles in the mixed solution of the graphite-stripping agent in the second reactor to obtain the graphite, graphene and stripping agent mixtures. A centrifugal hydrophobic mechanism is for removing the stripping agent in the mixture of graphite, graphene and stripping agent to obtain a mixture of graphite and graphene. A first drying mechanism is for drying the graphite and the graphene mixture. A sintering mechanism is for sintering the mixture of graphite and graphene. A third reactor is extracting graphite and graphene mixture to obtain a mixed solution of graphene and graphite mixed solution. A fourth reactor for electrolyzing the graphene mixed solution to separate the water slurry and precipitation of aqueous graphene. A second drying mechanism is for freeze-drying aqueous graphene to obtain solid graphene. A third drying mechanism is for high-temperature drying treatment of graphite mixed solution to obtain fixed graphite. The screening mechanism, first reactor, mixing mechanism,second reactor, centrifugal hydrophobic mechanism, the first drying mechanism, sintering mechanism, third reactor, a fourth reactor and a second drying mechanism are sequentially connected. The bubble generating means and the ultrasonic blasting mechanism are respectively connected with the second reaction kettle. The third drying mechanism being respectively connected with the output end of the third reactor and the input of the screening mechanism is connected. DESCRIPTION OF DRAWING(S) - The diagram shows a schematic representation of graphene preparing device.