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  • 专利标题:   Method for patterned graphene layer involves forming catalytic metal layer on graphene layer, placing patterned film on substrate, removing catalytic metal layer, providing graphene layer on substrate, and removing support layer.
  • 专利号:   KR2013096837-A, KR1461978-B1
  • 发明人:   JUNG M, RHO J, SEO B, MOON J
  • 专利权人:   LG ELECTRONICS INC
  • 国际专利分类:   C01B031/02, G03F007/004, H01L021/302
  • 专利详细信息:   KR2013096837-A 02 Sep 2013 C01B-031/02 201381 Pages: 12
  • 申请详细信息:   KR2013096837-A KR018360 23 Feb 2012
  • 优先权号:   KR018360

▎ 摘　　要

NOVELTY - Method for patterned graphene layer involves forming catalytic metal layer on graphene layer, placing patterned film on substrate, removing catalytic metal layer, providing graphene layer on substrate, and removing support layer. USE - Manufacture of patterned graphene (claimed). DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for patterned graphene.