▎ 摘　　要

NOVELTY - Preparing an antimicrobial graphene composition involves using 5-45 pts. wt. tea saponin, 10-50 pts. wt. graphene oxide and 0.01-2 pts. wt. dispersant. The tea saponin purity of 75% or more. The tea saponin is dissolved in a solvent to obtain 5-20% tea saponin solution. The dispersant is added in the solvent, then graphene oxide is added to the solvent toobtain 0.2-20mg/ml graphene oxide solution. The obtained solution is subjected to ultrasonic dispersion for 30-240 minutes to form a graphene suspension. USE - Method for preparing an antimicrobial graphene composition for high absorbent resin (claimed). DETAILED DESCRIPTION - Preparing an antimicrobial graphene composition involves using 5-45 pts. wt. tea saponin, 10-50 pts. wt. graphene oxide and 0.01-2 pts. wt. dispersant. The tea saponin purity of 75% or more. The tea saponin is dissolved in a solvent to obtain 5-20% tea saponin solution. The dispersant is added in the solvent, then graphene oxide is added to the solvent toobtain 0.2-20mg/ml graphene oxide solution. The obtained solution is subjected to ultrasonic dispersion for 30-240 minutes to form a graphene suspension. The graphene suspension is added to saponin solution which is subjected to ultrasonic dispersion for 30-120 minutes to form a tea saponin intercalated graphene suspension. The obtained suspension is subjected to freezing and drying to obtain final product.