• 专利标题:   Preparing an antimicrobial graphene composition for preparing high absorbent resin, involves using tea saponin, graphene oxide and dispersant, where the tea saponin is dissolved in a solvent to obtain tea saponin solution.
  • 专利号:   CN107522996-A
  • 发明人:   HONG X, LIU R, PEI X, ZHOU P
  • 专利权人:   ZHEJIANG SATELLITE NEW MATERIAL SCI
  • 国际专利分类:   C08J003/24, C08K003/04, C08K005/00, C08K009/04, C08L033/02, C08L033/14, C08L033/24, C08L071/02
  • 专利详细信息:   CN107522996-A 29 Dec 2017 C08L-033/24 201810 Pages: 14 Chinese
  • 申请详细信息:   CN107522996-A CN10930018 09 Oct 2017
  • 优先权号:   CN10930018

▎ 摘  要

NOVELTY - Preparing an antimicrobial graphene composition involves using 5-45 pts. wt. tea saponin, 10-50 pts. wt. graphene oxide and 0.01-2 pts. wt. dispersant. The tea saponin purity of 75% or more. The tea saponin is dissolved in a solvent to obtain 5-20% tea saponin solution. The dispersant is added in the solvent, then graphene oxide is added to the solvent toobtain 0.2-20mg/ml graphene oxide solution. The obtained solution is subjected to ultrasonic dispersion for 30-240 minutes to form a graphene suspension. USE - Method for preparing an antimicrobial graphene composition for high absorbent resin (claimed). DETAILED DESCRIPTION - Preparing an antimicrobial graphene composition involves using 5-45 pts. wt. tea saponin, 10-50 pts. wt. graphene oxide and 0.01-2 pts. wt. dispersant. The tea saponin purity of 75% or more. The tea saponin is dissolved in a solvent to obtain 5-20% tea saponin solution. The dispersant is added in the solvent, then graphene oxide is added to the solvent toobtain 0.2-20mg/ml graphene oxide solution. The obtained solution is subjected to ultrasonic dispersion for 30-240 minutes to form a graphene suspension. The graphene suspension is added to saponin solution which is subjected to ultrasonic dispersion for 30-120 minutes to form a tea saponin intercalated graphene suspension. The obtained suspension is subjected to freezing and drying to obtain final product.