• 专利标题:   High dielectric polyimide film comprises polyimide and graphene oxide uniformly filled in the polyimide.
  • 专利号:   CN112480670-A
  • 发明人:   XU J
  • 专利权人:   FUYANG SHENBANG NEW MATERIAL TECHNOLOGY CO LTD
  • 国际专利分类:   C08L079/08, C08K003/04, C08G073/10, C08J005/18, H01G004/18, H01G004/33
  • 专利详细信息:   CN112480670-A 12 Mar 2021 C08L-079/08 202130 Pages: 10 Chinese
  • 申请详细信息:   CN112480670-A CN11306532 20 Nov 2020
  • 优先权号:   CN11306532

▎ 摘  要

NOVELTY - High dielectric polyimide film comprises polyimide and graphene oxide uniformly filled in the polyimide. USE - Used as high dielectric polyimide film. ADVANTAGE - The high dielectric polyimide film improves the dielectric property of the polyimide, the dielectric loss of the polyimide film is quickly reduced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing high dielectric polyimide film comprising (1) adding diamine monomer and tetracarboxylic dianhydridemonomer for polycondensation reaction to obtain polyamic acid, adding dehydrating agent and imidization agent for imidization reaction to obtain the polyimide, (2) mixing the polyimide obtained in step (1) with graphene oxide uniformly, coating film on the carrier and heating treatment to obtain the high dielectric polyimide film; and #thin film capacitor comprising the high dielectricpolyimide film.