• 专利标题:   Graphene and carbon nanotube vacuum vapor deposition apparatus comprises reaction chamber deposition system, water-cooling system, cooling system, electrode control system and gas control system.
  • 专利号:   CN205874533-U
  • 发明人:   LIU S, CUI H, LIU X
  • 专利权人:   UNIV JILIN
  • 国际专利分类:   C23C016/26, C23C016/455, C23C016/458, C23C016/46, C23C016/52
  • 专利详细信息:   CN205874533-U 11 Jan 2017 C23C-016/26 201713 Pages: 13 Chinese
  • 申请详细信息:   CN205874533-U CN20631827 24 Jun 2016
  • 优先权号:   CN20631827

▎ 摘  要

NOVELTY - The utility model belongs to nano-structure film material preparation technology field, claims a CVD method preparing graphene and carbon nano-tube vacuum vapour deposition apparatus, comprising a reaction chamber of the deposition system, water cooling system, air cooling system, electrode control system and a gas control system, water cooling system is composed of a copper pipe, a cooling circulating water and cooling water pipe, self-cooling system by the cooling air cover and the cooler; the electrode control system is composed of a resistance wire heating plate, two stainless steel supporting frames and two insulating mica meeting the condition; electrode control system is composed of a resistance wire heating plate, two stainless steel support frame and two insulating mica; gas control system by a gas mass flow meter are arranged in sequence of the hydrogen generator, argon gas, methane gas, hydrogen gas bottle. The utility model meets the condition of the resistance wire heating plate, stainless steel and insulating isolation element, reduces the original device of the temperature limit.