▎ 摘　　要

NOVELTY - Forming a graphene film involves depositing a carbon source onto a substrate within a deposition environment comprising a vacuum to form the graphene film on the substrate, where the carbon source comprises coal, a coal component, or a combination. USE - Method for forming a graphene film. ADVANTAGE - The apparatus can be used to carry out a method of forming a graphene film. The method can make graphene films that are one atom thick or multiple atoms thick from convenient carbon sources such as coal or natural gas. The method can be easily scaled-up to efficiently provide large amounts of graphene films. The method can utilize solid carbonaceous fuels in a Chemical vapor deposition (CVD) system. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a graphene film formed by the method; and (2) an apparatus, which comprises a chemical vapor deposition unit comprising a deposition environment, and an injector unit that is configured to inject a carbon source entrained in a gas into the deposition environment for deposition on a substrate and formation of a graphene film, the carbon source comprising coal, a coal component, or a combination. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a low pressure entrained-coal chemical vapor deposition system. CVD system (5) Gas tanks (10) Gas-mixing manifold (20) EC feed system (30) Tube furnace (40) Pressure gauges (50) Vacuum pump (60)