▎ 摘　　要

NOVELTY - Manufacture of patterned metal nanosphere array layer involves manufacturing a polymer mold in which a nano-pillar pattern protruding from a surface is formed, preparing a metal nanosphere solution by mixing a metal precursor, a capping agent, and a solvent, forming a metal nanosphere array layer by injecting the metal nanosphere solution on the polymer mold to a height below the column height of the nanopillar pattern, laminating a high-temperature release film on the polymer mold on which the metal nanosphere array layer is formed, and peeling the patterned metal nanosphere array layer from the polymer mold. USE - Manufacture of patterned metal nanosphere array layer used for manufacturing electronic device chosen from display, semiconductor, transistor, light-emitting diode, solar cell, photoelectrochemical cell, photocatalyst, laser device, memory, sensor, and diode (all claimed). ADVANTAGE - The method produces patterned metal nanosphere array layer which improves plasmon-induced resonance energy transfer or hot electron transfer phenomenon by inducing interaction of near field and amplifying the electromagnetic field on the electrode surface when applying to the electronic device, and can quickly and selectively separate and move the charges generated in the photoelectrode by improving the plasmon-induced resonance energy transfer or thermal electron transfer mechanism, and improves light absorption and inhibits recombination of excited charges and holes, thus improving photocurrent density and battery life. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of an electronic device, which involves transferring and printing the high-temperature release film to which the metal nanosphere array layer is adhered to one surface of a substrate.