▎ 摘　　要

NOVELTY - Monocrystalline silicon substrate is processed in solution of sulfuric acid (98 %mass) and hydrogen peroxide (30 %mass). Resultant processed substrate is cleaned with water, dried, and immersed in dilute solution of aminosilane coupling agent. Resultant substrate having aminosilane coupling agent film, is cleaned with water, and dried. Obtained substrate is immersed in dilute solution of graphene oxide, cleaned with water, and dried. Obtained substrate having graphene oxide nanosheet, is subjected to thermal reduction, and cooling, to obtain graphene lubrication film. USE - Preparation of graphene lubrication film used as protection and lubrication material in micro-machine. ADVANTAGE - The method economically provides graphene lubrication film having excellent wear resistance, and antifriction property, by a simple process. DETAILED DESCRIPTION - Aminosilane coupling agent and mixed solvent of acetone and water, in volume ratio of 95:5 are mixed, to obtain dilute solution of aminosilane coupling agent. A monocrystalline silicon substrate is soaked in solution of sulfuric acid (98 %mass) and hydrogen peroxide (30 %mass) in volume ratio of 7:3, and the substrate is processed at 90 degrees C for 0.5-1 hour. The resultant processed substrate is ultrasonically cleaned with ultrapure water, and dried under nitrogen atmosphere. The dried substrate is then immersed in obtained dilute solution of aminosilane coupling agent, and maintained for 0.5-1 hour. The resultant substrate is ultrasonically cleaned in ultrapure water, and dried under nitrogen atmosphere, to obtain monocrystalline silicon substrate having aminosilane coupling agent film, at the surface. Graphene oxide is dissolved in ultrapure water, and ultrasonically dispersed to obtain dilute solution of graphene oxide. The obtained monocrystalline silicon substrate is then immersed in the obtained dilute solution of graphene oxide, and the solution is maintained at 80 degrees C for 6-12 hours. The resultant substrate is ultrasonically cleaned in ultrapure water, and dried under nitrogen atmosphere, to obtain monocrystalline silicon substrate having graphene oxide nanosheet at surface. The obtained monocrystalline silicon substrate having graphene oxide nanosheet at surface, is subjected to thermal reduction at 200 degrees C for 2-4 hours in rate of 1 degrees C/minute under argon atmosphere, and naturally cooling, to obtain graphene lubrication film.