▎ 摘 要
NOVELTY - The method (100) involves depositing a metal from a first source of carbon and from a second source on a surface of a support to form (110) a first layer, and forming (120) a second layer over the first layer, in which the second layer has a diffusion barrier material. The solubility of carbon in the diffusion barrier material is less than in the metal. A graphene layer is formed from the first layer on the surface of the carrier by temperature treatment (130). USE - Method for processing substrate used in manufacture of electronic devices and integrated circuits in semiconductor industry. ADVANTAGE - The graph with a layer of carbon atoms in a hexagonal arrangement has improved electronic properties which enable production of transistor having improved response and/or switching behavior. The two-dimensional materials for microelectronics are important for developing various types of sensors, transistors and the like, which are challenging to incorporate these two-dimensional materials in a microchip to emulate the silicon technology. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic flow diagram of a method for processing a substrate. (Drawing includes non-English language text) Method for processing substrate (100) Forming first layer (110) Forming second layer (120) Temperature treatment (130)