▎ 摘　　要

NOVELTY - Preparation of graphene film under pressure comprises applying pressure on graphene oxide at not greater than 12 MPa, placing to high-frequency induction graphitization furnace, vacuumizing, passing through nitrogen protective gas while performing graphitization reaction at 2800-3000 degrees C to form non-oxidizing gas atmosphere, and removing oxidative functional groups and metal impurities to obtain graphene film; and removing pressure of graphene film, taking out, and mechanically rolling into desired thickness. USE - The method is for preparation of graphene film under pressure. ADVANTAGE - The method is simple, appplies pressure to graphene film to reduce structural defects caused by the removal of oxygen-containing functional groups inside the film, improves the surface roughness of graphene, increases grain size, and improves mechanical properties, tensile strength, flexibility and surface quality.