• 专利标题:   Preparing high purity fluorinated graphene involves utilizing nitrogen trifluoride as fluorine source, adding pre-treated graphene to reactor, hermetically sealing reactor under inert gas atmosphere, and heating reactor.
  • 专利号:   CN105621399-A
  • 发明人:   FANG Z, LIU C, ZHANG M, ZHAO J, ZHOU J
  • 专利权人:   SHANDONG ZHONGSHAN PHOTOELECTRIC MATERIAL CO LTD
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN105621399-A 01 Jun 2016 C01B-031/04 201653 Pages: 7 Chinese
  • 申请详细信息:   CN105621399-A CN10985274 25 Dec 2015
  • 优先权号:   CN10985274

▎ 摘  要

NOVELTY - Preparing high purity fluorinated graphene involves utilizing nitrogen trifluoride as fluorine source and adding pre-treated graphene into the reactor. The reactor is hermetically sealed under inert gas atmosphere and heated to 100-150 degrees C for 1-4 hours. The high purity nitrogen trifluoride gas is added to fluorination reactor. The reactor temperature is adjusted to 350-550 degrees C and pressure is adjusted to 0.1-1.0MPa for 12-48 hours. The product is collected and heating is stopped. The inert gas in reactor is replaced and product is added to deionized water. The solution is rapidly stirred. USE - Method for preparing high purity fluorinated graphene (claimed). ADVANTAGE - The method enables to prepare high purity fluorinated graphene in simple and safe manner that has high quality and wide range of applications. DETAILED DESCRIPTION - Preparing high purity fluorinated graphene involves utilizing nitrogen trifluoride as fluorine source and adding pre-treated graphene into the reactor. The reactor is hermetically sealed under inert gas atmosphere and heated to 100-150 degrees C for 1-4 hours. The high purity nitrogen trifluoride gas is added to fluorination reactor. The reactor temperature is adjusted to 350-550 degrees C and pressure is adjusted to 0.1-1.0MPa for 12-48 hours. The product is collected and heating is stopped. The inert gas in reactor is replaced and product is added to deionized water. The solution is rapidly stirred and then allowed to settle. The supernatant is collected to obtain fluorinated graphene. The obtained fluorinated graphene is dispersed in solution of hydrofluoric acid and then washed for 6-12 hours. The solution is filtered and then washed multiple times with deionized water. The obtained product is ultrasonically dispersed in appropriate amount of volatile solvent. The product is freeze dried to obtain high purity fluorinated graphene. The exhaust gas treatment of reactor is carried out.