▎ 摘　　要

NOVELTY - This utility model claims a kind of used for chemical gas phase deposition apparatus graphene impurity gas adsorbing device, comprising a flow channel, the one end of a mixed gas inlet of a graphene chemical vapour deposition, is equipped with several groups of semiconductor refrigeration sheet outer side of the air flow channel, a refrigerating sheet through a connection to form electric low temperature gas cold trap and absorb the impurity gas, the air flow passage and the other end is purified gas outlet. This utility model is a semiconductor refrigeration device, a method of low temperature adsorption, to remove the impurity gas mixed in the gas source, the structure is simple, it is convenient to use, and it is easy to maintain.