▎ 摘　　要

NOVELTY - Forming super slip by in-situ formation of graphene and onion by friction interface comprises e.g. (i) pairing fullerene-like carbon and a graphite-like carbon nanostructure film to form a friction pair, and forming graphene and onion at friction interface; (ii) carrying out plasma chemical vapor deposition of methane or acetylene; (iii) passing methane or ethane gas, adjusting pulse bias to 800-1200 V, maintaining methane gas pressure and adjusting ethane and hydrogen pressure ratio to prepare fullerene-like carbon film; (iv) preparing graphite-like carbon nanostructure by plasma chemical vapor deposition of methane or acetylene, controlling auxiliary power supply to substrate, passing methane or ethane gas, adjusting pulse bias to 800-1000 V, conductance ratio 0.5-0.8 at frequency 30-50 KHz and adjusting methane gas pressure at 15-18 Pa, methane and hydrogen pressure ratio is 1:-1:1, the hardness of film is 7-14 GPa, the thickness is 1-5 mu m, and surface roughness is 0.05-0.5 nm. USE - The method is useful for forming super slip by in-situ formation of graphene and onion by friction interface. ADVANTAGE - The method reduces the contact area of the friction pair or friction interface force through spherical contact or non-common surface contact, friction coefficient and wear rate to improve service life and sensitivity of existing high-end equipment aerospace components which cannot meet the requirements of 10-15 years. DETAILED DESCRIPTION - Forming super slip by in-situ formation of graphene and onion by friction interface comprises (i) pairing fullerene-like carbon and a graphite-like carbon nanostructure film to form a friction pair, and forming graphene and onion at a friction interface; (ii) carrying out plasma chemical vapor deposition of methane or acetylene to form fullerene carbon nanostructures; (iii) passing methane or ethane gas with a purity greater than 99.99%, adjusting pulse bias to 800-1200 V, where conduction ratio is 0.5-0.7 at 30-80KHz, maintaining methane gas pressure at 14-18 Pa, and adjusting ethane and hydrogen pressure ratio is 1:1-1:3 adjustable to prepare fullerene-like carbon film, where film has a hardness of 18-32 GPa, a thickness is 1-5 mu m, and a surface finish of 0.1-0.5 nm; (iv) preparing graphite-like carbon nanostructure by plasma chemical vapor deposition of methane or acetylene, controlling auxiliary power supply to substrate at 150-350 degrees C, passing methane or ethane gas, adjusting pulse bias to 800-1000 V, conductance ratio 0.5-0.8 at frequency 30-50 KHz and adjusting methane gas pressure at 15-18 Pa, methane and hydrogen pressure ratio is 1:-1:1, the hardness of the film is 7-14 GPa, the thickness is 1-5 mu m, and the surface roughness is 0.05-0.5 nm.