▎ 摘　　要

NOVELTY - Producing (M1) graphene involves preparing graphite oxide substrate by exfoliating several graphene oxide sheets in aqueous solution, neutralizing the aqueous solution, centrifuging the solution, and allowing at least a portion of the water in the solution to evaporate or spin coating the solution on a material to provide for graphite oxide substrate having substrate depth; placing the substrate in an inert environment; and exposing an area of the substrate to a laser beam while in the inert gaseous environment to create a trench of graphene having a trench depth. USE - For producing graphene (claimed) used in electronic devices. ADVANTAGE - The method allows production of graphene using a continuous or pulsed laser beam, in both focused and unfocused conditions, on a substrate of graphite oxide in an inert environment. The graphene produced by the present method having n- or p- type characteristics and also having improved electrical properties. DETAILED DESCRIPTION - Producing (M1) graphene involves: preparing a graphite oxide substrate by exfoliating several graphene oxide sheets in an aqueous solution, neutralizing the aqueous solution to produce neutralized aqueous solution, centrifuging the neutralized aqueous solution, and allowing at least a portion of the water in the aqueous solution to evaporate or spin coating the aqueous solution on a material to provide for the graphite oxide substrate having a substrate depth; placing the graphite oxide substrate in an inert environment; and exposing an area of the graphite oxide substrate to a laser beam while in the inert gaseous environment to create a trench of graphene having a trench depth. INDEPENDENT CLAIMS are included for the following: (1) graphene produced from the method (M1); and (2) a system for producing graphene, comprising a laser source for providing a laser beam; a graphite oxide substrate produced by exfoliating several graphene oxide sheets in an aqueous solution, neutralizing the aqueous solution to produce neutralized aqueous solution, centrifuging the neutralized aqueous solution, and allowing at least a portion of the water in the aqueous solution to evaporate or spin coating the aqueous solution on a material to provide for the graphite oxide substrate having a substrate depth; and an inert gaseous environment provided by a gas flow cell having a gaseous inlet and a gaseous out, where the graphite oxide substrate is disposed within the inert gaseous environment, and where an area of the graphite oxide substrate is exposed to the laser beam to create a graphene trench having a trench depth.