• 专利标题:   Preparation of bent graphite structure-inserted carbon fluoride film used in integrated circuit, involves introducing hydrocarbon source gas and fluorine carbon source gas to substrate, ionizing, decomposing gas, forming graphene layer and protective layer on substrate, and bending substrate.
  • 专利号:   CN114590793-A
  • 发明人:   WEI L
  • 专利权人:   SUZHOU KEGUOZHI NEW MATERIAL TECHNOLOGY CO LTD
  • 国际专利分类:   C01B032/10, C01B032/186, C01B032/194
  • 专利详细信息:   CN114590793-A 07 Jun 2022 C01B-032/10 202259 Chinese
  • 申请详细信息:   CN114590793-A CN10246676 14 Mar 2022
  • 优先权号:   CN10246676

▎ 摘  要

NOVELTY - Preparation of bent graphite structure-inserted carbon fluoride film involves cleaning inert substrate, placing inert substrate in a vacuum chamber, mixing hydrocarbon source gas with fluorine carbon source gas, introducing into a process chamber, ionizing and decomposing the hydrocarbon source gas and the fluorine carbon source gas, forming a graphene layer on the substrate and forming a protective layer on the graphene layer, bending the substrate for many times, and removing the substrate and the protective layer are removed to obtain a carbon fluoride film. USE - Preparation of bent graphite structure-inserted carbon fluoride film used as low dielectric constant material in integrated circuit. ADVANTAGE - The preparation method is economical and easy, and utilizes the characteristics of bent structure of graphite to conduct heat in the longitudinal direction to prepare carbon fluoride film with relative thermal stability, excellent uniformity and repeatability, and low pollution.