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  • 专利标题:   Graphene patterning method involves adhering two different substrates, coating graphene oxide on upper substrate and then forming patterned bonding layer on graphene oxide-coated substrate.
  • 专利号:   KR2013127114-A, KR1364593-B1
  • 发明人:   CHANG S T, KIM N H
  • 专利权人:   UNIV CHUNG ANG IND ACAD COOP FOUND, UNIV CHUNGANG IND ACAD COOP FOUND
  • 国际专利分类:   C01B031/02, C23C016/00, H01L021/027
  • 专利详细信息:   KR2013127114-A 22 Nov 2013 C01B-031/02 201419 Pages: 19
  • 申请详细信息:   KR2013127114-A KR050778 14 May 2012
  • 优先权号:   KR050778

▎ 摘　　要

NOVELTY - Graphene patterning method involves separating substrate (a), adhering substrate (b) to substrate (a), coating graphene oxide on substrate (a) and then forming a patterned bonding layer on graphene oxide-coated substrate. USE - Graphene patterning method (claimed). ADVANTAGE - The method is carried out efficiently and economically.