▎ 摘　　要

NOVELTY - The method involves synthesizing the silicon quantum dots of 1-30nm by the method of the organic silicon precursor and the size of the uniform size by the solvent thermal method. The silicon quantum dots supported by graphene oxide are prepared through the non covalent self-assembly method to realize the high homogeneity of the silicon quantum dots on the graphene oxide. The graphene oxide supported silicon quantum dots are prepared by heat treatment to restore the graphene oxide. The mixture is placed for 0.5-12 hours to obtain height uniform size of 1-30nm. USE - Method for preparing silicon quantum point cathode material of graphite support. ADVANTAGE - The cost of invention is low, and the technique is simple and controllable. The power consumption is low. The performance is high, and circulation is very stable. DESCRIPTION OF DRAWING(S) - The drawing shows the photographic view of the method for preparing silicon quantum point cathode material of graphite support.