▎ 摘　　要

NOVELTY - Patterning of graphene oxide film involves providing a substrate (201), depositing a graphene oxide film (202) on the substrate, exposing a portion of graphene oxide film to photonic irradiation for reducing the portion of graphene oxide film, producing pattern (206) of reduced graphene oxide area (203) in graphene oxide film, and selectively-depositing polar material (205) on graphene oxide film with respect to pattern of reduced graphene oxide area. USE - Patterning of graphene oxide film used in production of graphene-based electronic component. ADVANTAGE - The method enables efficient patterning of graphene oxide film with excellent chemical reactivity, surface topography, and thermal stability, and high density, and desired thickness and color. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) patterning device, which consists of a reactor and a flash lamp. The device is configured for holding the substrate inside the reactor, depositing graphene oxide film on the substrate, exposing the portion of graphene oxide film, and selectively-depositing polar material on unreduced graphene oxide (204) structure on the substrate; and (2) patterning apparatus, which consists of a processor and a memory coupled to the processor. The memory has program code instructions which are executed by the processor. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view explaining patterning of graphene oxide film. Substrate (201) Graphene oxide film (202) Reduced graphene oxide area (203) Unreduced graphene oxide (204) Polar material (205) Pattern (206)