▎ 摘　　要

NOVELTY - Chemical vapor deposition device comprises a furnace body (1), a furnace cover (2), an air inlet pipe (3), an air outlet pipe (4) and a controller (5). The furnace cover is arranged above the furnace body. The air inlet pipe is set at one side of the furnace body. The air outlet pipe and a controller are arranged on the other side of the furnace body. The controller is located above the air outlet pipe. The controller is set with a display screen and multiple control keys. The furnace body is set with a feeding mechanism, a switching mechanism, a push mechanism and a heating mechanism. The heating mechanism and the pushing mechanism are set on the inner wall of one side of the furnace body close to the air inlet pipe. The heating mechanism is located above the pushing mechanism. The feeding mechanism is set at the bottom of furnace body. The switching mechanism is arranged above the feeding mechanism. The lifting component is set on the lower part of the flat plate. USE - The chemical vapor deposition device is useful for batch preparation of graphene (claimed). DETAILED DESCRIPTION - Chemical vapor deposition device comprises a furnace body (1), a furnace cover (2), an air inlet pipe (3), an air inlet pipe (4) and a controller (5). The furnace cover is arranged above the furnace body. The air inlet pipe is set at one side of the furnace body. The air outlet pipe and a controller are arranged on the other side of the furnace body. The controller is located above the air outlet pipe. The controller is set with a display screen and multiple control keys. The furnace body is set with a feeding mechanism, a switching mechanism, a push mechanism and a heating mechanism. The heating mechanism and the pushing mechanism are set on the inner wall of one side of the furnace body close to the air inlet pipe. The heating mechanism is located above the pushing mechanism. The feeding mechanism is set at the bottom of furnace body. The switching mechanism is arranged above the feeding mechanism. The feeding mechanism comprises a lifting assembly, a flat plate, a feeding component and a collecting component. The lifting component is set on the lower part of the flat plate. The feeding component is set at one side of the flat plate is close to the air inlet pipe. The mobile phone module is set at the other side of the upper flat plate. The feeding component comprises two supporting units and multiple feeding units. The feeding unit are uniformly distributed between two supporting unit from top to bottom. The supporting unit comprises two vertical rods, the bottom end of the vertical rod is fixed on the flat plate. The feeding unit comprises a substrate and two support. The supporting rod corresponds with the supporting unit. The two ends of the support rod are respectively and fixedly connected with two vertical rods. The substrate is set on the two supporting rod. The bottom end of collecting assembly comprises two supporting rods and multiple inclined plates. The supporting rod is fixed on the flat plate. The inclined plate is uniformly distributed between the two supporting rods from up to down. The two ends of the inclined plate are respectively fixedly connected with the two supporting rods. The inclined plate is far away from one end of the switching mechanism is set with a limiting plate and the switching mechanism is arranged between the feeding assembly and the collection assembly. The switching mechanism comprises a first motor, a turntable and a containing box. The first motor is fixed on the inner wall of the furnace body. The first motor is connected with the turntable in transmission. The containing box is fixed on the turntable. The first motor is a stepping motor, a pitch angle of first electric machine is 90 degrees . DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the chemical vapor deposition device. Furnace body (1) Furnace cover (2) Air inlet pipe (3) Air inlet pipe (4) Controller (5)