• 专利标题:   Method for producing epitaxy structure, involves removing graphene layer from support substrate, and transferring graphene layer to be positioned on flexible substrate.
  • 专利号:   KR2019115699-A, KR2068322-B1
  • 发明人:   HONG Y, JUNGJOONSUCK, CHOI J
  • 专利权人:   UNIV SEJONG IND ACAD COOP FOUND
  • 国际专利分类:   H01L033/00, H01L033/16, H01L033/44
  • 专利详细信息:   KR2019115699-A 14 Oct 2019 H01L-033/00 201988 Pages: 24
  • 申请详细信息:   KR2019115699-A KR038706 03 Apr 2018
  • 优先权号:   KR038706

▎ 摘  要

NOVELTY - The method involves providing a support substrate (10). The crystal layer (11) having a first crystal surface is provided on the support substrate. The graphene layer (20) is provided on the crystal layer. The structure having the first crystal surface is provided on the graphene layer. The graphene layer is removed from the support substrate. The graphene layer to be positioned on the flexible substrate is transferred. USE - Method for producing epitaxy structure (claimed). ADVANTAGE - The epitaxial structure achieves stability, even in bending by transferring to a flexible substrate by separating the support substrate and the graphene layer without damaging the inorganic structure. The crystal characteristics of the substrate and the crystal layer Structures with various crystal orientations can be formed. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an epitaxy structure. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the epitaxy structure. Epitaxy structure (1) Support substrate (10) Crystal layer (11) Graphene layer (20) Thin film structure (31)