▎ 摘　　要

NOVELTY - The method involves forming an amorphous carbon thin film (30), having a thickness of 0 to 7 nm or less on a substrate (10). The substrate is selected from silicon, quartz, bare glass, fluorinated tin oxide coated glass, indium tin oxide (ITO) coated glass and metal. The amorphously formed amorphized carbon thin films (30) are formed by performing metal sputtering process for 1 to 3 minutes at a current density of 30-80 mA per cm. The substrate in a deposition chamber is placed for thermally depositing carbon on the substrate. A carbon source is placed in the deposition chamber for performing thermal evaporation of the carbon. The metal sputtering uses multiple metal targets of chromium, vanadium, titanium, aluminum, molybdenum, platinum, ruthenium, tantalum, tungsten, niobium, rhodium, thorium, and zirconium. USE - Method for manufacturing metal-graphene-microporous graphite carbon composite used in hydrogen sensor device (Claimed). ADVANTAGE - The method is economical and environmentally friendly, and does not use toxic substances. The carbon composite has excellent hydrogen sensor performance. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of method for manufacturing metal-graphene-microporous graphite carbon composite used in hydrogen sensor device. Substrate (10) Amorphized carbon thin films (30) Amorphous carbon thin film (30) Ion plasma (50) Metal-graphene-microporous graphite carbon composite (100)