• 专利标题:   Method for manufacturing graphene sealing film, involves peeling of first graphene layer from base substrate in order to transcribe on first organic layer.
  • 专利号:   KR2015086037-A, KR1578154-B1
  • 发明人:   KYUNG W P, SEUNG Y J, TAE S Y, TAEK S K
  • 专利权人:   KOREA ADVANCED INST SCI TECHNOLOGY
  • 国际专利分类:   H01L051/52
  • 专利详细信息:   KR2015086037-A 27 Jul 2015 H01L-051/52 201554 Pages: 15
  • 申请详细信息:   KR2015086037-A KR006158 17 Jan 2014
  • 优先权号:   KR006158

▎ 摘  要

NOVELTY - The method involves forming (S100) of first graphene layer on a base substrate. A first organic layer is welded (S200) on the desired substrate. The first graphene layer is mechanically peeled (S300) from the base substrate in order to transcribe on the first organic layer. USE - Method for manufacturing graphene sealing film. ADVANTAGE - The external moisture and the gas can be effectively blocked. The quality of the graphene is high. The mass production is possible. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a manufacturing method of organic electronic device. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the manufacturing method of graphene sealing film. (Drawing includes non-English language text) Step for forming first graphene layer (S100) Step for welding first organic layer (S200) Step for peeling first graphene layer (S300)