▎ 摘　　要

NOVELTY - Preparation of wafer/reduced graphene/gold nanocomposite material involves functionalizing amino groups on surface with silica-coated silicon wafers to obtain amino-modified silicon wafers, and dropping ethanol solution of graphene oxide (GO) on silica gel sea to obtain graphene oxide-modified silicon wafer (wafer/GO); and immersing ((wafer/GO)) in sealed tube containing 4-vinylpyridine (P4VP) monomer, irradiating with ultraviolet light for 30-180 minutes, taking out wafer, and rinsing with chloroform solution. USE - Method for preparing wafer/reduced graphene/gold nanocomposite material used for obtaining different morphology on surface of graphene, distributing homogeneous gold nanostructures, and detecting organic small molecules. DETAILED DESCRIPTION - Preparation of wafer/reduced graphene/gold nanocomposite material comprises functionalizing amino groups on surface with silica-coated silicon wafers to obtain amino-modified silicon wafers, and dropping ethanol solution of graphene oxide (GO) on silica gel sea to obtain graphene oxide-modified silicon wafer (wafer/GO); immersing ((wafer/GO)) in sealed tube containing 4-vinylpyridine (P4VP) monomer, irradiating with ultraviolet light for 30-180 minutes, taking out wafer, and rinsing with chloroform solution to obtain silicon wafer/Graphene/poly 4-vinylpyridine brush (wafer/GO/ 4VP brush); soaking (wafer/GO/ 4VP brush) in aqueous solution of chloroauric acid for 6-18 hours, removing, washing wafer with deionized water, absorbing silicon wafer with tetrachloroaurate ions to obtain silicon/GO/P4VP brush, and placing in closed container containing pyrrole for 1-8 hours, where silicon/GO /P4VP brush does not contact with pyrrole to obtain silicon/Graphene/poly-4-vinylpyridine brush/polypyrrole-gold composite (wafers/GO/P4VP/PPy-Au composites); treating wafers/GO/P4VP/PPy-Au composites at 400-800 degrees C for 0.5-3 hours without oxygen to obtain silicon/reduced graphene/gold composite materials (wafers/GO/Au composite material).