▎ 摘　　要

NOVELTY - The method involves preparing a first substrate including a circuit including a circuit element formed on the translucent substrate and a first insulating film covering the circuit. A layer containing graphene is formed on the first insulating film. The semiconductor layer including a light emitting layer is formed on the layer containing graphene. The semiconductor layer is etched to form a light emitting element (150-1,150-2). The layer containing the graphene, the light emitting element, and the second insulating film covering the first insulating film are formed. The vias penetrating the first insulating film and the second insulating film is formed. The light emitting element and the circuit element are electrically connected through the via on a light emitting surface facing the surface of the light emitting element on the side of the first insulating film. USE - Manufacturing method for image display device (claimed). ADVANTAGE - The transfer process of the light emitting element is shortened and the yield is improved is realized. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an image display device. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the image display devices. (Drawing includes non-English language text) Sub-pixels (20-1,20-2) Circuit board (100) Light emitting elements (150-1,150-2) Color filter (180) Film contact bonding layer (188)