▎ 摘　　要

NOVELTY - Polarizer based on graphene/polymer hybrid wave guide structure comprises a straight wave guide based on the core layer of a rectangular optical wave guide, from left to right, a graphene/polymer hybrid wave guide with an input straight wave guide and a single layer of graphene film placed on the surface of the core layer of the optical wave guide, and the output straight wave guide. The input straight wave guide and the output straight wave guide are sequentially composed of a silicon wafer substrate (21) and a polymer prepared on the silicon wafer substrate under cladding layer (22), optical wave guide core layer (23) of rectangular structure prepared on polymer under cladding layer. The first polymer upper cladding layer (25') with the same thickness, the second polymer upper cladding layer is prepared on the surface of the optical wave guide core layer and the first polymer upper cladding layer. USE - Polarizer based on graphene/polymer hybrid wave guide structure. ADVANTAGE - The polarizer does not need complicated and expensive processing equipment and the laws of preparation technology, and is compatible with the traditional semiconductor technology, easy to integrate, and is suitable for large scale production, so it has important application prospect. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing a polarizer based on a graphene/polymer hybrid waveguide structure, which involves (A) cleaning the silicon wafer substrate, dissolving the dissociated silicon wafer substrate that meets the design dimensions in an acetone solution, subjecting to ultrasonic cleaning for 5-12 minutes, then repeatedly wipe with acetone and ethanol cotton balls in order, and using deionized water, rinsing thoroughly, and then blow dry with nitrogen, then baking at 90-120 degrees C for 1-3 hours to remove moisture; (B) spin-coating the polymer under-cladding layer on the cleaned silicon wafer substrate by spin coating, where the spin-coating speed is 2000-6000 revolutions per minute, and the polymer under-cladding is obtained after curing; (C) spin-coating the polymer optical waveguide core material on the polymer undercladding layer by a spin coating process, where the spin coating speed is 2000-5000 revolutions per minute, and the thickness is 2-6 mu m, processing at 60-70 degrees C for 10-30 minutes, and at 85-95 degrees C for 10-30 minutes for pre-baking, and then under the UV light with a wavelength of 350-400nm At the moment, the structure of the photolithographic mask is complementary to the optical waveguide core layer of the rectangular structure to be prepared, and the exposure time is 6 to 15 seconds, so that the organic polymer material of the optical waveguide core layer region of the rectangular structure to be prepared is exposed; (D) removing the lithographic mask, and processing for 10-30 minutes at 60-70 degrees C and 10-30 minutes at 90-100 degrees C for mid-baking, after the temperature naturally drops to room temperature, wet etching in a special developer solution for 20-40 seconds to remove the unexposed organic polymer material; (E) putting it into an isopropanol solution to clean and remove the remaining developer solution and photoresist, and then using deionized water, rinsing to remove the residual liquid, and then blow drying under nitrogen at 120-150 degrees C for 20-90 minutes, and then post-baking the hard film to obtain a rectangular optical waveguide core layer on the polymer undercladding layer; (F) spin-coating the first polymer upper cladding material on the optical waveguide core layer using a spin coating process at a spin coating speed of 2000-6000 revolutions per minute, and then at 60-70 degrees C for 10-30 minutes, 85-95 degrees C for 10-30 minutes for pre-baking, and then subjecting to UV exposure for 10-60 seconds under ultraviolet light at a wavelength of 350-400nm, processing at 60-70 degrees C for 10-30 minutes, and at 90-10 degrees C for 10-30 minutes, subjecting to intermediate baking, processing at 120-150 degrees C for30 minutes, post-baking for 90 minutes to obtain a first polymer upper cladding layer, and the first polymer upper cladding layer completely covers the optical waveguide core layer; (G) transferring graphene on the upper surface of the optical waveguide core layer in the corresponding area of the hybrid waveguide, placing a single layer of graphene with a PMMA support layer in a beaker filled with deionized water, and then transferring it to the optical waveguide core; (H) leaving it to dry for 30-120 minutes at 60-90 degrees C, gently dropping the acetone solution on the surface of the PMMA support layer with a dropper to remove PMMA, and using deionized water, removing the residual acetone solution and the obtained device is naturally dried and then processed at 70-100 degrees C for 30-120 minutes; and (I) spin-coating he second polymer upper cladding material on the graphene film and the input straight waveguide and the output straight waveguide by a spin coating process to obtain a finished product. DESCRIPTION OF DRAWING(S) - The drawing shows schematic view of the polarizer based on graphene/polymer hybrid wave guide structure. Silicon wafer substrate (21) Cladding layer (22) Optical wave guide core layer (23) Single layer graphene film (24) First polymer upper cladding layer (25')