▎ 摘　　要

NOVELTY - Synthesizing graphene oxide-mesoporous silicon surface hexavalent chromium imprinting material comprises (i) taking crystalline flake graphite and potassium permanganate, stirring, transferring mixed solution into the constant-temperature water bath, stirring and reacting, cooling, pouring, allowing to stand and settling, washing, (ii) adding hexadecyl trimethyl ammonium bromide (CTAB) and sodium hydroxide, mixing, performing ultrasonic process until it is colorless, , filtering, washing, (iii) refluxing material, vacuum drying, (iv) adding mixed solution of potassium dichromate, dissolving, stirring, (v) eluting hexavalent chromium (Cr(VI)) template ion in the material with 0.1M sodium hydroxide solution until the eluent to Cr (VI) by atomic absorption spectrometry detection, washing to neutrality with water, vacuum drying to obtain the graphene oxide-mesoporous silica surface hexavalent chrome ion imprinted material. USE - The method is useful for synthesizing graphene oxide-mesoporous silicon surface hexavalent chromium imprinting material. DETAILED DESCRIPTION - Synthesizing graphene oxide-mesoporous silicon surface hexavalent chromium imprinting material comprises (i) taking 3 g crystalline flake graphite and 18 g potassium permanganate, stirring uniformly, strongly stirring, slowly adding 400 ml concentrated sulfuric acid and phosphoric acid solution volume ratio of 961 into ice bath, stirring and reacting for 1 hour, controlling the reaction liquid temperature is not higher than 20 degrees C, removing ice bath, transferring the mixed solution into the constant-temperature water bath of 50 degrees C, stirring and reacting for 8 hours, slowly adding 400 ml the mixed solution into ice water, and transferring to 90 degrees C constant temperature oil bath is kept for 30 minutes, ending the reaction, naturally cooling the ultra-pure water to room temperature, pouring into the same volume, and adding hydrogen peroxide until there is no bubble generated therein, allowing to stand and settling, removing the supernatant, washing with de-ionized water and absolute ethyl alcohol respectively to wash for 3 times, vacuum drying at 70 degrees C to obtain graphene oxide (GO), (ii) adding 5.0 g hexadecyl trimethyl ammonium bromide (CTAB) and 0.2 g sodium hydroxide, mixing, performing ultrasonic process until it is colorless, adding 0.15 g GO obtained in step (i), ultrasonic processing for 3 hours, stirring at 40 degrees C for 2 hours, slowly adding 5.0 ml ethyl orthosilicate (TEOS), continue stirring for 12 hours, finishing the reaction, filtering, washing many times with ethanol, (iii) refluxing the material obtained in the step (ii) with 6 g/l of an ammonium nitrate-ethanol solution at 65 degrees C for 4 hours, repeating for 4 times to remove the CTAB, vacuum drying at 60 degrees C to obtain the graphene oxidemesoporous silica composite, (iv) adding 0.26 g mixed solution of potassium dichromate, dissolving in 15 ml water and 60 ml methanol, after dissolving the solid, dropping 1-5 ml gamma -ammonia ethyl ammonia propyl trimethoxy silane (KH792) for 1 hour, adding 0.10 g graphene oxide-mesoporous silica composite, ultrasonic process to make it disperse uniformly, stirring the mixed liquid at 40 degrees C under until the liquid is volatilized completely to obtain the solid product, (v) eluting hexavalent chromium (Cr(VI)) template ion in the material with 0.1M sodium hydroxide solution until the eluent to Cr (VI) by atomic absorption spectrometry detection, washing to neutrality with water, vacuum drying to obtain the graphene oxide-mesoporous silica surface hexavalent chrome ion imprinted material.