▎ 摘　　要

NOVELTY - Patterning a graphene, comprises forming a DNA pattern, and forming graphene on the DNA pattern. The DNA pattern is formed by forming a metal ion or positive charge pattern on a substrate, and adsorbing a DNA structure on the metal ion or positive charge pattern by incorporating the metal particles on the DNA structure. USE - The method is useful for patterning a graphene (claimed) in the manufacturing of semiconductor chip. ADVANTAGE - The method is capable of uniformly and simply patterning the graphene with high quality.