▎ 摘　　要

NOVELTY - A graphene nanostructure manufacturing method involves forming a graphene thin film on a substrate, and forming a self-assembled material thin film on the formed graphene thin film. A self-assembled nanostructure is formed using a thermal process or a solvent annealing process. The graphene thin film is etched from the self-assembled nanostructure, where the graphene thin film is utilized as a mask. USE - Method for manufacturing a graphene nanostructure e.g. graphene antidot lattice and graphene nanoribbon (all claimed), which is utilized for device fabrication. ADVANTAGE - The method enables controlling opening of a band gap through nano-scale modulation of a graphene structure, thus controlling electrical property of the graphene in an effective manner. The method enables device fabrication in an efficient manner. The method enables utilizing a magnetism granule that includes the block copolymer, thus enabling mass production of the graphene nanostructure in a parallel manner. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of blocks during a manufacturing process of a graphene nanostructure.