• 专利标题:   Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.
  • 专利号:   US2022319815-A1, KR2022136897-A, CN115209677-A, JP2022158194-A, TW202303675-A
  • 发明人:   TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI
  • 专利权人:   TOKYO ELECTRON LTD, TOKYO ELECTRON LTD
  • 国际专利分类:   H01J037/32, H05K007/20, C01B032/158, C01B032/182, C30B033/12, H01L021/3065, H01L021/31
  • 专利详细信息:   US2022319815-A1 06 Oct 2022 H01J-037/32 202283 English
  • 申请详细信息:   US2022319815-A1 US708600 30 Mar 2022
  • 优先权号:   JP062928

▎ 摘  要

NOVELTY - Upper electrode assembly (13) comprises: an electrode plate; a metal plate; and a heat transfer sheet disposed between the electrode plate and the metal plate and having a vertically oriented portion having vertically oriented graphene structures oriented along a vertical direction. The metal plate has coolant flow passage(s), gas diffusion space(s), and heating module(s). The heating module is disposed so as not to overlap the coolant passage. The additional heat transfer sheets are disposed between additional metal plates and have additional vertically oriented portions. The additional vertically and horizontally oriented portions are laminated in the horizontal direction. USE - The assembly is useful in a plasma processing apparatus i.e. plasma chemical vapor deposition apparatus, for processing a substrate using plasma. ADVANTAGE - The assembly improves a heat transfer efficiency in a thickness direction. The thickness of the heat transfer sheet can be reduced, and thus, the heat dissipation efficiency in the thickness direction can be improved. The heat transfer characteristics of the graphene structure are improved, since the graphene structures are oriented along the vertical direction. DESCRIPTION OF DRAWING(S) - The figure shows a vertical cross-sectional view of the plasma processing system. 2Plasma processing apparatus 10Plasma processing chamber 13Upper electrode assembly 20Gas supply 30Power supply