▎ 摘　　要

NOVELTY - Processing of carbon nanomaterial-containing film (110) involves forming a resist mask and/or metal mask on a film containing carbon nanomaterial provided on a substrate (100), irradiating the film (110) with light in presence of an etchant (108) containing an oxidizing agent, and removing the resist mask (106) and/or the metal mask. USE - Processing of carbon nanomaterial-containing film in manufacture of electronic device. ADVANTAGE - The method enables easy and rapid processing of carbon nanomaterial-containing film with excellent electrical properties. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of illustrating processing of carbon nanomaterial-containing film. Substrate (100) Photoresist (102) Resist mask (106) Etchant (108) Carbon nanomaterial containing film (110)