• 专利标题:   Self-aligned graphene FET, has grid metal layer formed with gate dielectric layer, and self-aligned metal layer covered on source electrode, drain electrode, conductive channel and grid metal layer.
  • 专利号:   CN103311276-A, CN103311276-B
  • 发明人:   JIN Z, ZHANG D, CHEN J, MA P, PENG S, SHI J
  • 专利权人:   INST MICROELECTRONICS CHINESE ACAD SCI
  • 国际专利分类:   H01L021/32, H01L021/335, H01L029/16, H01L029/772
  • 专利详细信息:   CN103311276-A 18 Sep 2013 H01L-029/16 201378 Pages: 11 Chinese
  • 申请详细信息:   CN103311276-A CN10226455 07 Jun 2013
  • 优先权号:   CN10226455

▎ 摘  要

NOVELTY - The FET has a gate dielectric layer (15) formed on a grid metal layer (16). A self-aligned metal layer (17) is connected with a semiconductor substrate (10) and an insulating layer (11). A conductive channel (12) is formed in the insulating layer. The conductive channel is provided with a graphite and source electrode (13). A drain electrode (14) is matched with the conductive channel. The self-aligned metal layer is covered on the source electrode, the drain electrode, the conductive channel and the grid metal layer. USE - Self-aligned graphene FET. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a self-aligned graphene FET preparing method. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a self-aligned graphene FET. Semiconductor substrate (10) Insulating layer (11) Conductive channel (12) Source electrode (13) Drain electrode (14) Gate dielectric layer (15) Grid metal layer (16) Self-aligned metal layer (17)