▎ 摘　　要

NOVELTY - Method for industrial mass production of silicon complex vertical graphene comprises (i) placing the silicon particles in a ball mill for grinding, filtering dust, using deionized water cleaning, and drying, (ii) uniformly paving the silicon particles in the bottom of the circular ring rotary device in the reaction cavity, (iii) placing the reaction electrode in the reaction cavity right above the bottom of the circular ring and parallel to it, (iv) vacuumizing the reaction cavity, (v) generating plasma by gas dissociation between the reaction electrode and the reaction particles, (vi) after the plasma size and color will not change, turning on device, (vii) according to the reaction silicon particle size, setting the corresponding rotating speed, (viii) setting the corresponding reaction time, and (ix) closing the power supply, stopping ventilation, cooling to room temperature, closing the vacuum pumping system obtain the silicon surface complex vertical graphene particles. USE - Method for industrial mass production of silicon complex vertical graphene. ADVANTAGE - The graphene-silicon complex particle is prepared by the plasma enhanced chemical vapor deposition method, where the circular ring is placed on the two rotating wheels, the circular ring can be slowly rotated by two rotating wheels, the reactant in the reaction in the ring will roll over along with the rotation, the reactant can be fully loaded, the production with low cost and low cost is realized.