▎ 摘　　要

NOVELTY - The new type utility claims have one kind based on chemistry gas phase depositing device is plasma assistant growing graphene, the device comprises machine frame, a tubular heating furnace, quartz tube and microwave device, the quartz tube by supporting mechanism fixed on machine frame above, the tube-type heating furnace chamber by sliding track connected on machine frame above the quartz tube outside wall radial slide, said device also comprises air inlet system, the air inlet system comprising source sum and sum for quartz tube, said quartz tube air inlet end from one quartz tube for sample end extending to quartz tube in, another end connected and sum source except in quartz tube, the microwave device in quartz tube surrounds outside the quartz air inlet tube outside. The utility model is new type firstly using microwave device for gas in plasma density distribution uniformity of plasma formation, again the quartz tube and carrying out heating growing graphene, deposition rate, film defect, film-forming effect is good.