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  • 专利标题:   Reflective mask comprises a substrate, a light absorbing layer over the substrate, and a reflective layer over the light absorbing layer, and reflective layer covers a first portion of the light absorbing layer.
  • 专利号:   US2022146924-A1, US11630386-B2
  • 发明人:   HSU P, WU T
  • 专利权人:   TAIWAN SEMICONDUCTOR MFG CO LTD
  • 国际专利分类:   G03F001/24, G03F001/40, G03F001/80
  • 专利详细信息:   US2022146924-A1 12 May 2022 G03F-001/24 202244 English
  • 申请详细信息:   US2022146924-A1 US579433 19 Jan 2022
  • 优先权号:   US750775P, US579433

▎ 摘　　要

NOVELTY - Reflective mask (200) comprises a substrate (210), a light absorbing layer (220) over the substrate, and a reflective layer (230) over the light absorbing layer. The reflective layer covers a first portion of the light absorbing layer, and a second portion of the light absorbing layer is free from coverage by the reflective layer, and an absorption pattern (240) over the reflective layer. USE - Reflective mask ADVANTAGE - The reflective mask reduces the neighboring die effect DESCRIPTION OF DRAWING(S) - The drawing shows the cross-sectional view of the reflective mask Reflective mask (200) Substrate (210) Light absorbing layer (220) Reflective layer (230) Absorption pattern (240)