• 专利标题:   Manufacturing graphene oxide from kish graphite by optionally pretreating kish graphite, intercalating with persulfate salt and acid, expanding intercalated kish graphite, and oxidizing expanded kish graphite to obtain graphene oxide.
  • 专利号:   WO2020229881-A1
  • 发明人:   VU T T, SUAREZ SANCHEZ R, NORIEGA PEREZ D
  • 专利权人:   ARCELORMITTAL
  • 国际专利分类:   C01B032/19
  • 专利详细信息:   WO2020229881-A1 19 Nov 2020 C01B-032/19 202097 Pages: 20 English
  • 申请详细信息:   WO2020229881-A1 WOIB054056 16 May 2019
  • 优先权号:   WOIB054056

▎ 摘  要

NOVELTY - Graphene oxide is manufactured from kish graphite by providing kish graphite; optionally, pretreating kish graphite; intercalating kish graphite with persulfate salt and acid at room temperature to obtain intercalated kish graphite; expanding intercalated kish graphite at room temperature to obtain expanded kish graphite; and oxidizing expanded kish graphite to obtain graphene oxide. USE - Manufacture of graphene oxide from kish graphite. ADVANTAGE - The method allows for the production of graphene oxide having good quality, is easy to implement at industrial scale, and is less polluting than methods of the prior art. During the expansion, the persulfate salt acts like an oxidant to oxidize the kish graphite. Since the persulfate salt is an important oxygen donor, the intercalation gap between two kish graphite layers is further improved, allowing the acid to enter more easily between the kish graphite layers. The persulfate salt will decompose and release oxygen gas, causing an instantaneous pressure in the kish graphite interlayers making an exponential expansion of graphite at room temperature. The energy consumption is reduced. The use of expanded kish graphite significantly reduces the oxidation time compared to the prior art methods. Since there is a higher expansion volume, it is easier to oxidize the kish graphite layers since the gap between two kish graphite layers is higher using the persulfate salt and the acid. Thus, the oxidation time is significantly reduced.