▎ 摘　　要

NOVELTY - Graphene film, is claimed. The graphene film has a thickness of 70-200 nm. The interior has a continuous layer of air bubbles, where the wall of bubbles includes graphene sheets with a 0.34 nm slice spacing and there are few defects in graphene sheets i.e. ID/IG greater than 0.01 and the AB stacking rate is greater than 80% without folds on the sheet. USE - Used as graphene film. ADVANTAGE - The graphene film has nano-thickness, independent, self-supporting, and heat-resistant, achieves physical cross-linking, no defect and folds, ensures the inter-lamellar AB structure content exceeds 80% and provides a research unit for the controlled usage of the function of graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing graphene film, comprising (i) adding graphene oxide into a 0.5-10 mu g/ml graphene oxide aqueous solution, using anodic alumina (AAO) as the base for suction filtration, and the thickness is 200-600 nm; (ii) attaching graphene oxide film to the AAO film and placing in a closed container, steaming at 60-100 degrees C high temperature fumigation HI for 1-10 hours; (iii) uniformly coating the solid transfer agent on the surface of the graphene film and heating at a temperature below the melting point of the solid transfer agent by less than 5 degrees C, allowing the solid transfer agent for curing; (iv) coating graphene film with a solid transfer agent i.e. left side at room temperature and automatically separating the graphene film from the AAO film; (v) supported the above-obtained graphene film by the solid transfer agent and slowly volatilizing the solid transfer agent at the temperature at which the solid transfer agent volatilizes to obtain self-supporting reduced graphene oxide film; and (vi) placing self-supporting reduced graphene oxide film in a high temperature furnace and annealing at high temperature of 2400-3000 degrees C for 1-12 hours and heating at a rate of not greater than 20 degrees C/minute.