▎ 摘　　要

NOVELTY - The method involves providing a substrate support assembly comprising two selectively interdigitable substrate support fixtures (100, 100'). A substrate e.g. copper foil substrate (108), for thin film synthesis is loaded onto the fixtures. The fixtures are interdigitated and positioned in a reaction chamber. A thin film is formed on a surface of the substrate. The substrate is unloaded from the fixtures, which comprise a semi-cylindrical shaped base unit (101) and an interdigitable finger-like substrate engagement unit (102). USE - Method for synthesizing a large area thin carbon film e.g. graphene film and boron nitride film (all claimed), using a CVD-type furnace for electronics application. ADVANTAGE - The method allows the substrate to be positioned in between and around the finger-like substrate engagement units and outer side of the fixture when the fixtures are interdigitated, thus achieving many-fold increase in width of the substrate. DETAILED DESCRIPTION - The reaction chamber is a horizontally-oriented cylindrical quartz tube reaction chamber. INDEPENDENT CLAIMS are also included for the following: (1) a method for supporting a substrate in a processing chamber for depositing a chemical vapor deposition (CVD) coating (2) a substrate support assembly for synthesizing a thin film using CVD (3) an apparatus for processing a substrate (4) an apparatus for synthesizing a thin film using CVD. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of fixtures placed in a manner in which the fixtures are brought together to form a substrate support assembly when a substrate is loaded onto the substrate support assembly. Interdigitable substrate support fixtures (100, 100') Semi-cylindrical shaped base units (101, 101') Interdigitable finger-like substrate engagement units (102, 102') Tube or rod elements (104, 104') Copper foil substrate (108)