▎ 摘　　要

NOVELTY - The method involves applying polymer layer (P) to first surface of graphene film (G), such that second surface of graphene film is in contact with growth substrate (L), applying thermal release polymer layer (T) to the polymer layer, removing the growth substrate to form transfer substrate comprising exposed graphene surface, and contacting exposed graphene surface with a target substrate. The growth substrate is a metal substrate. Graphene film is deposited on growth substrate by chemical vapor deposition (CVD) or plasma enhanced CVD (PECVD). USE - Method for transferring graphene film to transfer substrate (claimed). ADVANTAGE - Transfers graphene film from growth substrate to target substrate without negatively impacting physical, optical, and/or electrical properties of transferred graphene film. Provides processes for transfer of graphene films which are scalable and/or cost-effective. DETAILED DESCRIPTION - The polymer layer comprises polymethyl methacrylate (PMMA), polylactic acid (PLA), or polycarbonate (PC). The polymer layer is applied by dip coating, spin coating, spray coating polymer to graphene film. The thermal release polymer comprises polydimethylsiloxane or polyurethane. The thermal release layer is applied by pressing, roll-to-roll transfer, or lamination. The target substrate comprises glass. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of transfer substrate comprising graphene film. Graphene film (G) Growth substrate (L) Polymer layer (P) Thermal release polymer layer (T)