• 专利标题:   Enhancing surface adhesion of polyetherimide for metal plating involves contacting sulfuric acid with polyetherimide substrate surface to form pre-etched substrate, and contacting substrate with sulfuric acid and periodate ions mixture.
  • 专利号:   US2021102296-A1, WO2021133455-A2, WO2021133455-A3
  • 发明人:   NARUSKEVICIUS L, HYMAN M
  • 专利权人:   STATE RES INST CENT PHYSICAL SCI TECHN, HYMAN M, HYMAN M, STATE RES INST CENT PHYSICAL SCI TECHN
  • 国际专利分类:   C23C018/20, C23C018/24, C25D005/56, C23C014/02, C23C016/02
  • 专利详细信息:   US2021102296-A1 08 Apr 2021 C23C-018/20 202142 English
  • 申请详细信息:   US2021102296-A1 US064828 07 Oct 2020
  • 优先权号:   US911834P, US064828

▎ 摘  要

NOVELTY - Enhancing surface adhesion of polyetherimide for metal plating involves contacting sulfuric acid with a surface of a polyetherimide substrate for a first dwell time to form a pre-etched polyetherimide substrate, and contacting pre-etched polyetherimide substrate with a mixture of sulfuric acid and periodate ions for a second dwell time to form an oxidized polyetherimide surface. The oxidized polyetherimide surface is contacted with an alkaline metal hydroxide solution for a third dwell time without rinsing between the applying steps or between the applying and contacting steps. The polyetherimide comprises a low volume percentage of reinforcement particles, and process does not include contacting the polyetherimide substrate with nitric acid in the step. USE - Method for enhancing surface adhesion of polyetherimide for metal plating.