• 专利标题:   New halogen-substituted compound for manufacturing functionalized graphene oxide.
  • 专利号:   KR2014144150-A
  • 发明人:   KANG B, LEE D H, LEE C, ANN J, CHOI J
  • 专利权人:   DONG JIN SEMICHEM CO LTD
  • 国际专利分类:   C01B031/02, C07D209/48, C07D241/04, C07D403/06
  • 专利详细信息:   KR2014144150-A 18 Dec 2014 C07D-241/04 201505 Pages: 21
  • 申请详细信息:   KR2014144150-A KR069645 09 Jun 2014
  • 优先权号:   KR065715

▎ 摘  要

NOVELTY - A halogen-substituted compound (I), is new. USE - Halogen-substituted compound for manufacturing functionalized graphene oxide (claimed). ADVANTAGE - The halogen-substituted compound provides functionalized graphene oxide having excellent electroconductivity and dispersibility. DETAILED DESCRIPTION - A halogen-substituted compound of formula: (X)p-Ar-E-L (I), is new. X=F, Cl, Br or I; p=1-5; Ar=4-30C aryl or heteroaryl; L=-NH2, -SH, -OH, tosyl or -NHNH2;and E=linking group with Ar and L and chosen from 1-20C acyclic, cyclic or heterocyclic hydrocarbyl and 1-20C acyclic hydrocarbyl having carbonyl group. An INDEPENDENT CLAIM is included for manufacture of functionalized graphene oxide, which involves reacting the halogen-substituted compound and graphene oxide.